Full article: <a href="http://science.sciencemag.org.sci-hub.cc/content/352/6290/1190" rel="nofollow">http://science.sciencemag.org.sci-hub.cc/content/352/6290/11...</a><p>These lenses are designed for a specific wavelength, and if I am reading the paper properly, only work with circularly polarised light. Essentially, for a given design wavelength and focal length there is a desired phase shift at each point on the lens. This phase shift is caused by the titanium dioxide "nanofins" which rotate the circularly polarised light to produce the desired phase shift. The phase shift is determined by the angle at which each fin is rotated. This produces a pattern of fins rotated relative to one another, which can be seen in the images of the BBC article.<p>While the lenses are designed for a target wavelength, they're not entirely useless at other wavelengths, they just have terrible chromatic aberration. In all other respects they seem to be excellent (especially for their size), but this makes them useless for most commercial applications.<p>To manufacture the lenses, they start with a substrate of silicon dioxide; not actually glass as said in the article, but quartz, like sand. This is coated by a resist, which is patterned by electron-beam lithography. The resist is "positive", meaning that the exposed part is removed when developed. A thin layer of titanium dioxide is deposited using atomic layer deposition. This is a type of thin film deposition technique that allows the deposition of a single atomic layer at a time. This is accomplished by introducing two different precursors one at a time alternately in sequence, the number of cycles determines the number of layers. With this they can essentially deposit just enough TiO2 to fill the holes left in the resist, though it also deposited on top of the unexposed resist.<p>The TiO2 remaining on top of the undeveloped resist is etched off and the undeveloped resist is removed, leaving just the nanofins. The nanofins have a high "aspect ratio", meaning height-to-width, which makes them challenging to produce using most semiconductor fabrication techniques. They are however quite large compared to modern semiconductors, on the order of hundreds of nanometers, which makes most things easier. Semiconductor fabrication uses photolithography, this used electron-beam lithography. While electron-beam lithography can in principle produce smaller feature sizes than photolithography (due to the smaller wavelength of electrons), that was not needed for this application; rather electron-beam lithography does not require the creation of a photomask and is consequently much more useful for small scale prototyping.<p>Commercially producing these lenses at scale could potentially be done with photolithography, though there would be a large upfront cost due to the need to fabricate photomasks. Monocrystalline silicon substrates are standard and silicon-dioxide-on-silicon is extremely common; I suspect the lenses could be fabricated on such a SiO2-Si substrate and the silicon on the back face removed, leaving optically transparent lenses.