The defect math is interesting, but process uniformity is more of a killer than the author gives it credit for. Fantastic amounts of ingenuity go into showerhead design, chamber design, and minute changes to process conditions, not to mention maintenance practices. We’d like to pretend the pattern and the process are orthogonal, but they’re coupled, and you might need to run 5C colder for one product versus another simply because the material exposed by the pattern loads the chamber differently. And how about water spots? Wet processing leaves water spots, just like you might see after washing your dishes. Huge source of defects, and once again pattern dependent. Patterning usually leaves alternating areas of hydrophilic and hydrophobic material, and you have to somehow prevent water from beading up anywhere. Sure, it starts out deionized, but it’s got plenty of junk in it after rinsing your wafers off.